Paper List 2021 (Atsushi Takahashi, Tokyo Tech)

Last modified: 10 March 2022

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi.
Fast EUV lithography simulation using convolutional neural network.
Journal of Micro/Nanopatterning, Materials and Metrology (JM3), Vol.20, No.4, 041202, September 24, 2021.
( SPIE Digital Library )
Yuta Ukon, Shimpei Sato, Atsushi Takahashi.
Design Method of Variable-Latency Circuit with Tunable Approximate Completion-Detection Mechanism.
IEICE Trans. Electronics, Vol.E104-C, No.7, pp.309-318, 2021.
( IEICE Transactions Online )

Tahsin Shameem, Shimpei Sato, Atsushi Takahashi, Hiroyoshi Tanabe, Yukihide Kohira, Chikaaki Kodama.
A Fast LUT Based Point Intensity Computation for OPC Algorithm.
Proc. the 23rd Workshop on Synthesis And System Integration of Mixed Information technologies (SASIMI 2021), R2-5, pp.92-97, online, March 30, 2021.
Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi.
Fast 3D lithography simulation by convolutional neural network.
Proc. SPIE 11614, Design-Process-Technology Co-optimization XV, 11614M, pp.1-7, February 22, 2021.
(SPIE Digital Library)

野中尚貴, 小平行秀, 東梨奈, 松井知己, 高橋篤司, 児玉親亮．
勾配判定法と劣勾配法を用いたマスク最適化．
第34回回路とシステムワークショップ論文集, pp.213-218, 2021年8月27日.

小平行秀，中山晴貴，野中尚貴，松井知己，高橋篤司，児玉親亮．
シミュレーテッド量子アニーリングを用いたマスク最適化手法．
電子情報通信学会技術研究報告, Vol.121, No.277, VLD2021-45, pp.162-167, 2021年12月2日.

Hiroyoshi Tanabe.
Classification of EUV masks based on the ratio of the complex refractive index k/(1-n).
Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021,V, 1185416, October 12, 2021.
(SPIE Digital Library)