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Paper List 2021 (Atsushi Takahashi)
Last modified: 10 March 2022
Paper
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Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi.
Fast EUV lithography simulation using convolutional neural network.
Journal of Micro/Nanopatterning, Materials and Metrology (JM3), Vol.20, No.4, 041202, September 24, 2021.
( SPIE Digital Library )
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Yuta Ukon, Shimpei Sato, Atsushi Takahashi.
Design Method of Variable-Latency Circuit with Tunable Approximate Completion-Detection Mechanism.
IEICE Trans. Electronics, Vol.E104-C, No.7, pp.309-318, 2021.
( IEICE Transactions Online )
International Conference
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Tahsin Shameem, Shimpei Sato, Atsushi Takahashi, Hiroyoshi Tanabe, Yukihide Kohira, Chikaaki Kodama.
A Fast LUT Based Point Intensity Computation for OPC Algorithm.
Proc. the 23rd Workshop on Synthesis And System Integration of Mixed Information technologies (SASIMI 2021), R2-5, pp.92-97, online, March 30, 2021.
(SASIMI Official Archive)
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Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi.
Fast 3D lithography simulation by convolutional neural network.
Proc. SPIE 11614, Design-Process-Technology Co-optimization XV, 11614M, pp.1-7, February 22, 2021.
(SPIE Digital Library)
Domestic Conference (including Japanese)
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野中尚貴, 小平行秀, 東梨奈, 松井知己, 高橋篤司, 児玉親亮.
勾配判定法と劣勾配法を用いたマスク最適化.
第34回 回路とシステムワークショップ論文集,
pp.213-218, 2021年8月27日.
Technical Report (including Japanese)
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小平行秀,中山晴貴,野中尚貴,松井知己,高橋篤司,児玉親亮.
シミュレーテッド量子アニーリングを用いたマスク最適化手法.
電子情報通信学会技術研究報告, Vol.121, No.277, VLD2021-45, pp.162-167, 2021年12月2日.
Lab Member Activity
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Hiroyoshi Tanabe.
Classification of EUV masks based on the ratio of the complex refractive index k/(1-n).
Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021,V, 1185416, October 12, 2021.
(SPIE Digital Library)
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