|
|
|
Paper List 2025 (Atsushi Takahashi)
Last modified: 14 April 2026
Paper
-
Hiroyoshi Tanabe, Atsushi Takahashi, Moe Sugiyama, Masayuki Shimoda.
Source-position-dependent transmission cross coefficient formula including polarization and mask three-dimensional effects in high-numerical-aperture extreme ultraviolet lithography.
Journal of Micro/Nanopattern. Mater. Metrol (JM3). Vol.25, No.??, ???, ?? ??, 2026.
(accepted)
International Conference
-
Moe Sugiyama, Masayuki Shimoda, Hiroyoshi Tanabe, Atsushi Takahashi.
EUV M3D parameter prediction of curvilinear mask patterns by convolutional neural networks.
Proc. SPIE 13980, DTCO and Computational Patterning V, 139801J, February 25, 2026.
(SPIE Digital Library)
-
Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi.
STCC formula including polarization and M3D effects in high-NA EUV lithography.
Proc. SPIE 13979, Optical and EUV Nanolithography XXXIX, 139790G, February 24, 2026.
(SPIE Digital Library)
Domestic Conference (including Japanese)
Technical Report (including Japanese)
-
沼尻晴貴，下田将之，高橋篤司．
L字型2層ボトルネックチャネル配線アルゴリズムの提案．
電子情報通信学会技術研究報告, vol.125, no.382, VLD2025-81, pp.30-35, 2026年3月4日.
-
朝永陽平，下田将之，高橋篤司．
ギャップチャネルにおける垂直チャネルの最大混雑度の最小化に関する一検討．
電子情報通信学会技術研究報告, vol.125, no.382, VLD2025-82, pp.36-41, 2026年3月4日.
To Top of Page
|
|
